Enhanced Performance of Oxidation of Rosalva (9-decen-1-ol) to Costenal (9-decenal) on Porous Silicon-Supported Silver Catalyst in a Microstructured Reactor
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The use of metal-assisted HF chemical etching as a convenient technique to produce a few microns thick porous layer in silicon microchannels was demonstrated. Gas phase selective oxidation of rosalva to its aldehyde (costenal) was performed in glass/silicon microstructured reactors at temperatures of 375–475 °C on silver catalyst which was deposited on both porous and flat silicon surface by sputter-coating. The effects of temperature (375–475 °C), rosalva concentration (1.17%–3.43%), O2 to rosalva ratio (0.5–20) and residence time on the reaction were investigated. The reactivity of rosalva on the porous silicon supported silver was 5.7–6.4 times higher than on the thin film silver catalyst at 450 °C. Furthermore, activation energy for the porous silicon supported silver was lower. Isothermal conditions in the microreactors allowed high conversion and selectivity to be achieved in a wide range of temperature and oxygen concentration. At typical reaction conditions (1.75% rosalva, O2/rosalva = 3, residence time 18 ms and 450 °C), conversion of 97% and selectivity of 95% to costenal was achieved, corresponding to a turnover frequency of 268 h−1.